Formation of near-vertical trenches and fins with flat {−201} sidewalls on (512) β-Ga2O3 via TMAH wet etching

Takayoshi Oshima · 2026

Read Formation of near-vertical trenches and fins with flat {−201} sidewalls on (512) β-Ga2O3 via TMAH wet etching by Takayoshi Oshima (2026) in the Tower of Babel, a free online library of public-domain works preserved in clean, searchable text. No sign-up. The full text is served as a plain-text file at a predictable URL, where text is present: https://antarctic-labs.com/tower-of-babel/pmc-13592009.txt.

Description

Takayoshi Oshima reports a 2026 study on carving fine trenches and fins in a crystal used for power devices. The crystal is a gallium oxide with a stated face and cut. Wet etching with a common base gave walls that were near vertical and very flat, a shape that is hard to get with wet methods alone.

Oshima first mapped how fast the side etch ran across a related face, and found the chosen cut among the fastest. The flat rate rose fast with heat, which points to a surface bound process. Near vertical cuts formed only when the etch window lined up with one stated direction. The wall tilt matched the angle that crystal math predicts.

Catalog record

CREATORTakayoshi Oshima
YEAR2026
COLLECTIONPAPERS
FORMATTXT
FILE SIZE20 KB
VERSION1.0
LICENSECC BY 4.0
RIGHTSCC BY
SOURCEEurope PMC

Source: https://europepmc.org/articles/PMC13592009

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