Surface chemical environment regulation of carbon-based sorbent for the purification of organic impurities in H2O2
Jianguang Li, Tong Wang, Ziqin Chen, Zhikang Bao, Kang Shao, Jian Zhang, Feng Lin, Liang Lv · 2026
Read Surface chemical environment regulation of carbon-based sorbent for the purification of organic impurities in H2O2 by Jianguang Li, Tong Wang, Ziqin Chen, Zhikang Bao, Kang Shao, Jian Zhang, Feng Lin, Liang Lv (2026) in the Tower of Babel, a free online library of public-domain works preserved in clean, searchable text. No sign-up. The full text is served as a plain-text file at a predictable URL, where text is present: https://antarctic-labs.com/tower-of-babel/PMC13520332.txt.
Description
Jianguang Li and colleagues report in 2026 a modified carbon material that cleans organic impurities from hydrogen peroxide destined for chip making. Even tiny amounts of leftover carbon compounds can spoil semiconductor devices, so peroxide for electronics must be very pure.
Treating activated carbon with sodium metaborate added surface groups that grab impurities by chemical bonding. The best version removed over 96 percent of organic impurities and left residue low enough to meet the electronic-grade standard. Model fits pointed to surface chemistry as the step that controls speed. Industry readers gain a practical sorbent design tested at two peroxide strengths.
Catalog record
| CREATOR | Jianguang Li, Tong Wang, Ziqin Chen, Zhikang Bao, Kang Shao, Jian Zhang, Feng Lin, Liang Lv |
|---|---|
| YEAR | 2026 |
| COLLECTION | PAPERS |
| FORMAT | TXT |
| FILE SIZE | 27819 |
| LICENSE | https://creativecommons.org/licenses/by/4.0 |
| RIGHTS | CC BY |
| SOURCE | Europe PMC |