Plasma-Side Analysis of Chemical-to-Ion Flux Balance and Ion Energy-Angular Distributions in Ar/O2 Capacitively Coupled Plasmas for MoS2-Relevant Low-Damage Patterning
Cheol Woong Kim, Geonwoo Park, Hae June Lee · 2026
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Description
Cheol Woong Kim, Geonwoo Park, and Hae June Lee simulate a plasma used to pattern atom-thin MoS2 in a 2026 study. Etching such films without damage means controlling which ions arrive, how hard, and at what angle. The team modelled an argon-oxygen discharge driven at low voltage, varying the gas mix from argon-rich to oxygen-rich. They tracked particles, electric potential, and the energy and angle of ions striking the centre and edge of the electrode.
More oxygen thinned the electrons, swelled negative oxygen ions, and flipped the main positive ion from argon to oxygen. Ion energies mostly rose with oxygen, though unevenly, and edge fields tilted the incoming angles. Linking ion and oxygen-radical flows through a simple surface scheme exposed a trade-off: very argon-rich and very oxygen-rich mixes both look damaging.
Catalog record
| CREATOR | Cheol Woong Kim, Geonwoo Park, Hae June Lee |
|---|---|
| YEAR | 2026 |
| COLLECTION | PAPERS |
| FORMAT | TXT |
| FILE SIZE | 44 KB |
| LICENSE | https://creativecommons.org/licenses/by/4.0 |
| RIGHTS | CC BY |
| SOURCE | Europe PMC |