Evolution of Chemical, Structural, and Mechanical Properties of Titanium Nitride Films with Different Thicknesses Fabricated Using Pulsed DC Magnetron Sputtering
Wei Mao, Runze Qi, Jiali Wu, Zhe Zhang, Zhanshan Wang · 2024
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Description
Wei Mao and four co-authors track how titanium nitride films change as they grow from ten to forty nanometers thick, in a 2024 study. Such films serve as release layers when X-ray telescope mirror shells are copied by electroforming. Nanometer-scale thickness effects on their structure and properties were little studied.
The team deposited films by pulsed magnetron sputtering and profiled their chemistry, structure, surface, and internal stress. With thickness, the films moved from glassy disorder to oriented crystals, and grains grew. Surface roughness rose in steps matching those structural changes. Element and bond proportions varied with depth, refining density estimates. Bigger crystals meant lower internal stress, but rougher surfaces. Balancing the trade-offs, the authors nominate about twenty-five nanometers as the sweet spot for the mirror release application.
Catalog record
| CREATOR | Wei Mao, Runze Qi, Jiali Wu, Zhe Zhang, Zhanshan Wang |
|---|---|
| YEAR | 2024 |
| COLLECTION | PAPERS |
| FORMAT | TXT |
| FILE SIZE | 31 KB |
| VERSION | 1.0 |
| LICENSE | CC BY 4.0 |
| RIGHTS | CC BY |
| SOURCE | Europe PMC |